This text goes beyond the physics of ion implantation to treat the principles and design criteria of equipment needed to fabricate and process microelectronic devices. It covers a wide variety of ion
sources, beam extraction and acceleration techniques, and system designs that are useful in applications. For engineers and physicists involved in studying, designing, or using ion beams for research or for
semiconductor device fabrication, this volume will be a unique source of practical information. Because of its scope of coverage, it will also be of use to researchers using ion beam apparatus. |
